Overview of Tantalum carbide
Tantalum carbide is a light brown metallic cubic crystalline powder, belonging to the sodium chloride type cubic crystal system. Currently, tantalum carbide TaC carbide sintered are also used as grain growth inhibitors, grain growth inhibition effect is remarkable, a density of 14.3g / cm3. It is insoluble in water, hardly soluble in inorganic acid, and soluble in a mixed acid of hydrofluoric acid and nitric acid. It can be decomposed and has strong oxidation resistance. It is easy to be melted and decomposed by potassium pyrosulfate. High conductivity, room temperature resistance is 30Ω, showing superconducting characteristics. Tantalum carbide can be used in powder metallurgy, cutting tools, fine ceramics, chemical vapor deposition, wear-resistant hard alloy tools, tools, molds, and it is wear-resistance, corrosion additive structural member, in order to improve the toughness of the alloy. Sintered tantalum carbide TaC substantially gold, may be used as a wrist watch.
Applications of tantalum carbide
Tantalum carbide plays an important role in the cemented carbide. It is to improve the properties of the alloy by improving the fiber structure and phase transition kinetics, the alloy having a higher strength, phase stability and machining deformation. Tantalum carbide having a high melting point (4000 deg. C) and excellent thermodynamic stability (mp â–³ Gf = -154kj / mol). Tantalum can particularly effectively promote nucleation and prevent the precipitation of carbon in the brittle nucleus crystal film formed in the later stage of solidification. Its main functions are:
(1) Preventing the carbide grain growth;
(2) Form a third dispersed phase other than WC, Co and TiC together, thereby significantly improving the thermal shock resistance of the cemented carbide, crater wear resistance and anti-oxidation resistance, improve the red hardness.
Chemical vapor deposition for preparing tantalum carbide
CVD method to prepare TaC coating requires the use of raw material -TaCl5. TaCl5 evaporates at 500K. The vaporized TaCl5 is used as a gas source and poured into the CVD furnace. Deposit with other introduced reducing atmosphere to form TaC. The reaction procedure is as follows:
TaCl5+CmHn+H2→TaC+HCl+H2
When TaC coating prepared using a CVD process, the process with good controllability, the coating composition and structure can be designed. However, due to the residual thermal stress, the coating cracks easily prepared. Ta2C and TaC likely to occur when the deposition of the equipment performance and maintenance demanding, high production costs.
Supplier of Tantalum carbide
As a global Tantalum carbide supplier, Tanki New Materials Co., Ltd. has extensive experience in the performance, application and cost-effective manufacturing of advanced engineering materials. The company has successfully developed a series of powder materials (titanium nitride, silicon nitride, titanium nitride, etc.) high-purity targets, functional ceramics and structural devices, and provides OEM services For the latest price of Tantalum carbide, send us an email or click on the needed products to send an inquiry.
