Salt and Alkali Metal Solution of CuO

In principle, any soluble copper salt could be used as a precursor to prepare CuO nanostructures without much difference, or at least there seems to be no report on the influence of copper salt precursor. Various copper salts such as chloride, nitrate, sulfate, and acetate were used to prepare CuO nanomaterials. However, the effect of different copper salts should have been discussed in detail. However, the particle size and uniformity of copper nanoparticles crafted from copper acetate seem better than those from inorganic copper salt. A reasonable explanation is that carboxylate groups are still adsorbed on the surface of the copper oxide nanoparticles and play the role of a surfactant and suppress nanoparticles from the growth and aggregating process. The other primary precursor for synthesizing CuO nanoparticles is the base agent, which provides hydroxyl ions to react with copper salt and precipitations the Cu(OH)2. The most commonly used precursors are sodium hydroxide and potassium hydroxide. NaOH is preferred because it is much less expensive than KOH, and both compounds give almost the same effect due to their similar properties. NH4OH could also be utilized; however, the high volatility of NH4OH brings some limitations during the synthesis process, and hence, NH4OH appears only in a few reports of preparing CuO nanoparticles. Sun et al. reported that using ammonia may enhance the accumulation of the products due to the high polar nature of ammonia. The mole ratio between copper ion and OH− group should be 1: 2; however, many salts of Cu readily hydrolyze in water and thus induce high solution acidity (pH < 2), while pH can play an essential role in the dynamic process during the reaction. Hence, the Cu2+/OH− ratio in the precursor solution could be adjusted from report to report to obtain the desired morphology and size nanoproduct. If you are looking for high quality, high purity, and cost-effective copper oxide, or if you require the latest price, please email contact mis-asia.