The basis of silicon nitride ceramics

In aerospace applications, good resistance and rigidity under high temperatures, as well as low weight and low thermal expansion, are particularly important – all of which are properties found in structural components made of Silicon nitride. This makes the ceramic of interest for, among other things, housings of reconnaissance and observation cameras and for support structures of satellites. The advantage here is that the low thermal expansion, even in the case of extreme temperature fluctuations such as those that occur in near-earth space, hardly causes any shifts within the high-precision optical lens system. This means the resolution and imaging accuracy of the camera can be significantly improved. The basis of silicon nitride ceramics is silicon extracted from pure quartz sand (SiO2). Silicon nitride is then usually formed through a reaction of pure silicon with nitrogen at around 1,200 °C / 2,192 °F. Ceramic components made of silicon nitride are then produced using liquid-phase sintering from fine Silicon nitride powder, which is mixed with other sintering additives to enable complete compaction. The compaction and needle-shaped recrystallization of the silicon nitride particles is caused by sintering at high temperatures (1,800 to 1,900 °C / 3,272 – 1,652 °F) and under high pressure in a nitrogen atmosphere. This creates an interconnected structure, which gives the material its high degree of strength and f, fracture toughness, andlent resistance to temperature change. A wide range of component shapes can be achieved by using ceramic forming processes. Due to the toughness and hardness of the material, it’s usually only possible to process sintered components using diamond tools. If you are looking for high quality, high purity and cost-effective Silicon Nitride, or if you require the latest price of Silicon Nitride, please feel free to email contact mis-asia.